Semiconductor Material and Device Characterization, 2/e

Semiconductor Material and Device Characterization is the only book on the market devoted to the characterization techniques used by the modern semiconductor industry to measure diverse semiconductor materials and devices. It covers the full range of electrical and optical characterization methods while thoroughly treating the more specialized chemical and physical techniques.

This newly revamped and expanded Second Edition incorporates the many innovations that have come to dominate the field during the past decade. From scanning probe techniques to the detection of metallic impurities in silicon wafers to the use of microwave reflection to measure contactless resistivity, each chapter presents state-of-the-art tools and techniques, most of which were in their infancy or had not yet been developed when the previous edition first came out. Featured here are:

• An entirely new chapter on reliability and probe microscopy
• Numerous examples and end-of-chapter problems — new to this edition
• Five hundred illustrations revised for this edition
• Updated bibliography with over 1,200 references
• Easy-to-use text including a real-world mix of units rather than strictly MKS units.

This practical new edition is ideal for textbook adoptions at the graduate level and is destined to become an essential reference for research and development teams in the semiconductor industry.

Table of Contents

Resistivity.

Carrier and Doping Density.

Contact Resistance, Schottky Barriers, and Electromigration.

Series Resistance, Channel Length and Width, Threshold Voltage, and Hot Carriers.

Defects.

Oxide and Interface Trapped Charges, Oxide Integrity.

Carrier Lifetime.

Mobility.

Optical Characterization.

Chemical and Physical Characterization.

Appendices.

Index.