Plasma Etching: An Introduction
暫譯: 等離子蝕刻:入門指南

Manos, Dennis M., Flamm, Daniel L.

  • 出版商: Academic Press
  • 出版日期: 1989-07-28
  • 售價: $3,110
  • 貴賓價: 9.5$2,955
  • 語言: 英文
  • 頁數: 476
  • 裝訂: Hardcover - also called cloth, retail trade, or trade
  • ISBN: 0124693709
  • ISBN-13: 9780124693708
  • 相關分類: 電路學 Electric-circuits
  • 已絕版

商品描述

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

商品描述(中文翻譯)

等離子體蝕刻在微電子電路製造中扮演著重要的角色。本書適合研究人員、製程工程師和研究生,介紹了電氣放電的基本物理和化學,並將其與等離子體蝕刻機制相關聯。在整本書中,作者提供了製程化學、設備設計和生產方法的實際範例。