CMOS Plasma and Process Damage
暫譯: CMOS 等離子體與製程損傷

Prall, Kirk

CMOS Plasma and Process Damage
  • 出版商: Springer
  • 出版日期: 2025-05-17
  • 售價: $5,080
  • 貴賓價: 9.5 折 $4,826
  • 語言: 英文
  • 頁數: 466
  • 裝訂: Hardcover - also called cloth, retail trade, or trade
  • ISBN: 3031890280
  • ISBN-13: 9783031890284
  • 相關分類: CMOS

    • 海外代購書籍(需單獨結帳)

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商品描述

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.

商品描述(中文翻譯)

本書探討了建造CMOS電腦晶片的複雜技術，並涵蓋了晶片製造過程中可能出現的一些不尋常問題。讀者將了解高能量製程所引起的等離子體和製程損傷，這些損傷會對晶片造成傷害，導致功能失效和可靠性問題。

作者簡介

Kirk D. Prall (M'82) was born in 1958. He received the Ph.D. degree in electrical engineering from the University of New Mexico, Albuquerque, in 1990., He worked for Philips Semiconductors from 1982 to 1991, in the areas of EPROM, ROM, microprocessors. He joined Micron, Inc., Boise, ID, in 1991 and has been doing research and development in DRAM and flash memories. He is currently assigned as Director of Flash Process Development. He has published several papers and holds 90 patents.

作者簡介(中文翻譯)

Kirk D. Prall (M'82) 於1958年出生。他於1990年在新墨西哥大學（University of New Mexico, Albuquerque）獲得電機工程博士學位。他於1982年至1991年間在飛利浦半導體（Philips Semiconductors）工作，專注於EPROM、ROM和微處理器的領域。1991年，他加入美光科技（Micron, Inc.），位於愛達荷州博伊西（Boise, ID），並從事DRAM和快閃記憶體的研究與開發。目前，他擔任快閃製程開發總監（Director of Flash Process Development）。他已發表多篇論文並擁有90項專利。

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