Photomask Fabrication Technology

Benjamin G. Eynon, Banqiu Wu

  • 出版商: McGraw-Hill Education
  • 出版日期: 2005-08-01
  • 售價: $5,260
  • 貴賓價: 9.5$4,997
  • 語言: 英文
  • 頁數: 500
  • 裝訂: Hardcover
  • ISBN: 0071445633
  • ISBN-13: 9780071445634
  • 下單後立即進貨 (約1週~2週)



Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book. This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes


Table of Contents:


Data Preparation and Design

Pattern Generation

Pattern Transfer

Photomask Metrology

Defect Control and Finishing

Inspection, Repair, and Cleaning

Resolution Enhancement Techniques

Water Fabrication Issues

Future Developments