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商品描述
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
商品描述(中文翻譯)
這本書是半導體乾蝕刻技術的必備參考資料，將幫助工程師開發新的蝕刻工藝，以進一步實現半導體集成電路的小型化和集成化。作者描述了設備製造流程，並解釋了乾蝕刻實際使用的流程部分。內容設計為針對在晶片製造商、設備供應商和材料供應商工作的工程師以及研究等離子體的大學學生的實用指南，重點關注他們最需要的主題，例如用於半導體設備的每種材料（如 Si、SiO2、金屬等）的詳細蝕刻過程、製造廠中使用的蝕刻設備、為何對於每種材料使用特定的等離子體源和氣體化學，以及如何開發蝕刻工藝。書中還描述了最新的關鍵技術，如 3D IC 蝕刻、雙重達瑪斯基蝕刻、低介電常數蝕刻、高介電常數/金屬閘蝕刻、FinFET 蝕刻、雙重圖案化等。
作者簡介
Kazuo Nojiri is a CTO of Lam Research Japan. He has 37 years of experience in semiconductor industry. Prior to joining Lam in 2000, he worked for Hitachi Ltd. for 25 years, where he held numerous management positions for Dry Etching and Device Integration. He is also known as a pioneer in the research field of charging damage. He published 38 technical papers and 3 books. In 1984 he was awarded the Okouchi Memorial Prize for the development of ECR plasma etching technology.
作者簡介(中文翻譯)
Kazuo Nojiri 是 Lam Research Japan 的首席技術官 (CTO)。他在半導體產業擁有 37 年的經驗。在 2000 年加入 Lam 之前，他在日立 (Hitachi Ltd.) 工作了 25 年，擔任過多個乾蝕刻 (Dry Etching) 和裝置整合 (Device Integration) 的管理職位。他也是充電損傷 (charging damage) 研究領域的先驅之一。他發表了 38 篇技術論文和 3 本書籍。1984 年，他因開發 ECR 等離子體蝕刻技術而獲得了大內紀念獎 (Okouchi Memorial Prize)。
