Nanofabrication in the Era of Machine Learning
暫譯: 機器學習時代的奈米製造

This book highlights how converging advances in lithography, materials processing, metrology, and data-driven methods are redefining precision, scalability, and design freedom in nanoscale manufacturing. A central theme is the growing role of machine learning in nanofabrication. Data-driven approaches are shown to transform semiconductor manufacturing-from analysis of electron microscopy data to adaptive control of thin-film deposition and nanoparticle synthesis-by enabling smarter process control, predictive optimization, and rapid feedback from high-resolution characterization tools.

The book also offers in-depth coverage of state-of-the-art patterning technologies. Advances in extreme ultraviolet lithography, electron projection systems, and direct electron-beam writing are examined alongside their technical challenges and pathways toward higher throughput and resolution. Beyond subtractive and patterning methods, the volume explores novel manufacturing paradigms such as superplastic nanomolding and nanoscale additive manufacturing, highlighting their potential for creating complex nanophotonic structures and mechanically engineered metamaterials. By examining the constraints and emerging frontiers of nanofabrication, this work serves as an essential resource for those navigating the intersection of innovation and limitation in the field of nanofabrication.