Computational Lithography (Hardcover)

Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches.

The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented.

The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography.

Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.

《計算光刻中使用的模型和優化方法的綜合摘要》

光刻技術是當前集成電路製造技術中最具挑戰性的領域之一。半導體行業越來越依賴解析度增強技術（RETs），因為它們的實施不需要對製造基礎設施進行重大改變。《計算光刻》是第一本討論光刻中RETs的計算優化的書籍，深入探討了基於模型的數學優化方法在光刻中的最佳光學近距離修正（OPC）、相位移遮罩（PSM）和偏移軸照明（OAI）RET工具。

本書首先介紹了光刻系統、電磁場原理以及從數學角度的優化基礎知識。接著詳細描述了不同類型的優化算法來實現RETs。大多數開發的算法都基於OPC、PSM和OAI方法及其組合的應用。書中還描述了相干照明和部分相干照明系統的算法，並提供了大量的模擬來證明算法的有效性。此外，還提供了所有優化框架的數學推導。

書中提供的MATLAB®軟件文件使讀者能夠輕鬆運行和研究代碼，以便理解和應用優化算法，並設計一組最佳光刻遮罩。讀者還可以將這些代碼用於學術或工業組織中的研究和開發活動。書中還包含了一份MATLAB®軟件指南。讀者可以在ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography下載軟件並與指南一起使用。

《計算光刻》旨在為初學者和有經驗的讀者量身定制，適用於教師、研究生和研究人員，以及從事半導體集成電路製造、光刻和RETs相關研究或職業的科學家和工程師。計算光刻借鑒了逆問題、光學、優化和計算成像等豐富的理論，因此也適用於這些領域的研究人員和從業人員。