Run-To-Run Control in Semiconductor Manufacturing
暫譯: 半導體製造中的運行到運行控制
Moyne, James, Del Castillo, Enrique, Hurwitz, Arnon M.
商品描述
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine runs, thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
商品描述(中文翻譯)
運行到運行(R2R)控制是一項尖端技術,允許在機器運行之間修改產品配方,從而最小化過程漂移、偏移和變異性,並降低成本。其有效性已在多種過程中得到證明,例如氣相外延、光刻和化學機械平坦化。半導體行業廣泛採用這種高效過程控制的唯一障礙是對該技術缺乏理解。《半導體製造中的運行到運行控制》通過提供對R2R控制的深入分析,克服了這一障礙。
作者簡介
James Moyne, Enrique del Castillo, Arnon M. Hurwitz
作者簡介(中文翻譯)
詹姆斯·莫因 (James Moyne)、恩里克·德爾卡斯蒂略 (Enrique del Castillo)、阿農·M·赫維茨 (Arnon M. Hurwitz)