Plasma Processes for Semiconductor Fabrication

Description

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.

• Accessible introduction to an important technique in semiconductor manufacture
• Self-contained treatment
• Provides a glossary of technical terms

 

Table of Contents

1. Introduction; 2. Plasma processes and semiconductors; 3. Plasma electromagnetics and circuit models; 4. Plasma models; 5. Plasma chemistry; 6. Transport at long mean free path; 7. Evolution of the trench; 8. Physical description of the plasma; 9. Going further; 10. Glossary.

描述

等離子處理是半導體器件製造中的一項核心技術。這本自成一體的書提供了關於半導體製造中等離子刻蝕和沉積的最新描述。它介紹了這些過程的基本物理和化學原理，並展示了如何準確地進行模擬。作者首先概述了等離子反應器，並討論了理解等離子過程的各種模型。然後，他介紹了等離子化學，並詳細描述了複雜等離子系統的模擬，並參考了實驗結果。書末還附有一個有用的技術術語詞彙表。書中不需要對等離子物理學有先備知識。它包含許多練習題，是電氣工程和材料科學研究生學習等離子處理和技術的理想入門教材。對於半導體行業的實踐工程師來說，它也是一本有用的參考書。

目錄

1. 簡介；2. 等離子過程和半導體；3. 等離子電磁學和電路模型；4. 等離子模型；5. 等離子化學；6. 長平均自由程的傳輸；7. 槽的演變；8. 等離子的物理描述；9. 進一步探索；10. 技術術語詞彙表。